Colorimetric properties of ZrN and TiN coatings prepared by DC reactive sputtering

Nosé, M.; Mei, Zhou; Honbo, Eiji; Yokota, Masaru; Saji, Shigeoki

doi:10.1016/s0257-8972(01)01196-3

Cited by 56 publications

(36 citation statements)

References 23 publications

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“…The color change with the N/Ti ratio can be applied to the change resulting from oxygen because oxygen replaced nitrogen in the nitrides. The increment of oxygen resulted in the decrement in luminous reflectance of TiN [24]. However in present work, not all oxygen replaced oxygen, instead they partially combined with nitrogen.…”

Section: Colorationcontrasting

confidence: 54%

Colorimetric properties of TiN coating implanted by aluminum

Zhou¹,

Xue²,

Ling³

et al. 2005

Journal of Alloys and Compounds

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Section: Colorationcontrasting

confidence: 54%

Colorimetric properties of TiN coating implanted by aluminum

Zhou¹,

Xue²,

Ling³

et al. 2005

Journal of Alloys and Compounds

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“…Titanium nitride (TiN), in particular, is one of the most successful materials for industrial applications such as coatings for high-speed steel cutting tools, diffusion barriers in semiconductors, and coatings for decorative. [8][9][10][11][12][13] If the particle surface can be coated with TiN, the powder would gain new properties, and should find applications such as paint elements, polishing powders, and as diffusion barriers in metallurgy.…”

Section: Introductionmentioning

confidence: 99%

Surface Coating on Aluminum Flakes with Titanium Nitride Layer by Barrel-Sputtering Techniques

et al. 2008

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Flake-shaped fine particles were modified with a thin TiN layer by a hexagonal-barrel-sputtering technique. To determine the optimum sputtering conditions, TiN films were deposited on a glass substrate by the reactive sputtering technique by varying the values of N 2 percentage, total pressure, radio-frequency (RF) power, and substrate temperature. From the analysis of XRD patterns, it was determined that a N 2 percentage of 25%, a total pressure of 1.2 Pa, a RF power of 200 W, and room temperature were suitable for the preparation of TiN films. Under these optimized conditions, Al flakes were modified with a TiN by the barrel-sputtering technique. The results of optical microscopy, X-ray diffraction measurements, scanning electron microscopy, and energy-dispersive X-ray spectroscopy measurements revealed that the surface of each Al flake was successfully coated uniformly with a TiN layer.

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“…Examples currently being worked on at NREL include transparent conducting oxides (TCOs) for display, photovoltaic and window applications [3][4][5][6], metal nitride materials for optical coating, decorative coating and tribological applications [7][8][9][10][11] and tunable dielectrics for microwave electronics applications [12,13]. Compositionally graded thin film libraries can be made by a wide variety of thin film deposition techniques.…”

Section: Introductionmentioning

confidence: 99%