Comparative characterisation of zinc oxide thin films prepared from zinc acetate with or without water of hydration via the sol–gel method

Sol–gel synthesis of p-type zinc oxide using aluminium nitrate and ammonia

“…The XRD peaks can be indexed to the hexagonal phase with wurtzite structure. Clearly, there is a strong preference in the (0 0 2) orientation in good correlation with previously reported data [35]. During the synthesis of ZnO, c-axis orientation grew the fastest as ZnO exhibit higher surface energy for the polar plane (0 0 2) and lower energy in non-polar planes, which results in preferential growth in c-axis.…”

Facile synthesis of highly oriented p-type aluminum co-doped zinc oxide film with aqua ammonia

“…It is noted that hydrolysis of the precursor is an important step in the sol-gel production of zinc oxide. A previous study [35] observed an optoelectronics degradation of the films when anhydrous zinc acetate was used as the source with water excluded from the experiment. The zinc acetate transforms into mono-acetate Zn in IPA.…”

“…Indeed, the published results from the sol-gel synthesis of ZnO-related films have confirmed that the chemical compounds selection has a significant effect on the structure, optical and electrical properties of the film [34]. Copuroglu et al [35] showed that the combination of monoethanolamine (MEA) with alcohol can lower the crystallization temperature of aluminium doped zinc oxide (AZO) and create highly c-axis oriented films [35].…”

Synthesis of Mg and Zn diolates and their use in metal oxide deposition

“…[12][13][14][15][16] Moreover, MgO thin lms can be used for the protection of plasma display panels from erosion by ion bombardment. 17 Several deposition methodologies for MgO and ZnO layer formation exist, including the sol-gel process in combination with spin-coating, 18,19 spray pyrolysis, 20,21 pulsed laser deposition, 22,23 molecular beam epitaxy, 24 as well as metal-organic gas phase deposition techniques such as CVD (¼ chemical vapor deposition) [25][26][27] and ALD (¼ atomic layer deposition). 28,29 Among them, CVD and spin-coating provide convincing alternatives owing to their simplicity of processing control, covering of large areas and their capability to allow adherent and reproduceable lms at low cost.…”