Crystalline Si Solar Cells with Selective Emitter for Industrial Mass Production

Fath, P.; Kingshott, Peter; Kopecek, Radovan; Walter, F. J.; Klingbeil, S.; Schmidt, Michael; Melnyk, Igor; Henze, S.; Krümberg, J.; Bayer, K.; Winter, Patrick M.; Voyer, C.; Schmid, Alexander; Schlosser, R.E.; Münzer, Adolf; Maier, Janina; Kuhn, Tilmann; Keller, S.; Isenberg, J.; Holbig, E.; Geiger, M.; Frieß, T.; Breselge, Martin; Masouleh, F. Binaie; Esturo-Breton, A.

doi:10.4229/24theupvsec2009-2co.3.2

24th European Photovoltaic Solar Energy Conference 2009

DOI: 10.4229/24theupvsec2009-2co.3.2

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Crystalline Si Solar Cells with Selective Emitter for Industrial Mass Production

P. Fath

Peter Kingshott²,

Radovan Kopecek³

et al.

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Beam shaping - the key to high throughput selective emitter laser processing with a single laser system

Jäger

Oesterlin²,

Kimmerle

et al. 2010

2010 35th IEEE Photovoltaic Specialists Conference

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The fabrication of selective emitters by laser processing has attracted the interest of researchers in recent years. However, narrow foci of Gaussian laser beams limit the throughput and feature an inhomogeneous intensity distribution on the wafer. The use of beam shaping can eliminate this setback. A single laser system delivering <;70 Watt to the wafer is already sufficient to achieve short processing times per wafer. The feasibility of a laser system for a selective laser doping process from PSG is investigated and the potential of eligible beam shaping is assessed. Adequate sheet resistances with a good homogeneity and process stability can be achieved, with minor impact to random pyramid surfaces and no measureable degradation of the material. A diffractive optical element splitting one laser into 10 spots of equal intensity is evaluated and fast processing times are achieved

show abstract

Beam shaping - the key to high throughput selective emitter laser processing with a single laser system

Jäger

Oesterlin²,

Kimmerle

et al. 2010

2010 35th IEEE Photovoltaic Specialists Conference

View full text Add to dashboard Cite

show abstract

High efficiency selective emitter enabled through patterned ion implantation

Low¹,

Gupta²,

Gossmann³

et al. 2011

2011 37th IEEE Photovoltaic Specialists Conference

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20.3% efficiency rear passivated silicon solar cells with local back contact using commercial P-Cz wafers

Wang¹,

Han²,

Meng³

et al. 2012

2012 38th IEEE Photovoltaic Specialists Conference

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Crystalline Si Solar Cells with Selective Emitter for Industrial Mass Production

Cited by 4 publications

References 0 publications

Beam shaping - the key to high throughput selective emitter laser processing with a single laser system

Beam shaping - the key to high throughput selective emitter laser processing with a single laser system

High efficiency selective emitter enabled through patterned ion implantation

20.3% efficiency rear passivated silicon solar cells with local back contact using commercial P-Cz wafers

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