2021
DOI: 10.1108/cw-05-2020-0079
|View full text |Cite
|
Sign up to set email alerts
|

Design of bilayer graphene nanoribbon tunnel field effect transistor

Abstract: Purpose The purpose of this paper is to design novel tunnel field effect transistor (TFET) using graphene nanoribbons (GNRs). Design/methodology/approach To design the proposed TFET, the bilayer GNRs (BLGNRs) have been used as the channel material. The BLGNR-TFET is designed in QuantumATK, depending on 2-D Poisson’s equation and non-equilibrium Green’s function (NEGF) formalism. Findings The performance of the proposed BLGNR-TFET is investigated in terms of current and voltage (I-V) characteristics and tra… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1

Citation Types

0
3
0

Year Published

2022
2022
2024
2024

Publication Types

Select...
6
1

Relationship

0
7

Authors

Journals

citations
Cited by 11 publications
(3 citation statements)
references
References 32 publications
0
3
0
Order By: Relevance
“…50 nm length of GNR has been used in the channel region, and an N=16 A-GNR is used, where N is a number of a dimmer carbon atom. The GNR used in this device belongs to the n=3p+1 family, where p is a positive integer that behaves as a semiconductor [35]. Table 1: shows the detailed device parameter and specifications used for both structures, the proposed structures have identical architecture and dimensions, and only channel materials are different.…”
Section: Device Architecture and Simulation Set-upmentioning
confidence: 99%
See 1 more Smart Citation
“…50 nm length of GNR has been used in the channel region, and an N=16 A-GNR is used, where N is a number of a dimmer carbon atom. The GNR used in this device belongs to the n=3p+1 family, where p is a positive integer that behaves as a semiconductor [35]. Table 1: shows the detailed device parameter and specifications used for both structures, the proposed structures have identical architecture and dimensions, and only channel materials are different.…”
Section: Device Architecture and Simulation Set-upmentioning
confidence: 99%
“…QTX.MESH, QTY.MESH and QTUNN.DIR=ydir specific directions are included for tunneling direction in the simulator tools. The impact of generation and recombination on the account is activated by adding the Shockey-Reed-Hall recombination model (SRH) [35]. In addition, the concentration-mobility model (CONMOB) is also incorporated for low-field mobilities of charge carriers, and due to the importance of bandgap in the tunnel FET, the bandgap narrowing model (BGN) is needed to add to the simulation account [34].…”
Section: Device Architecture and Simulation Set-upmentioning
confidence: 99%
“…3. [18][19][20][21] Similar to the CMOSFET, the CNTFET has 4 regions in which undoped CNTs are positioned beneath the region of gate. Whereas, highly doped CNT is arranged under drain and source regions.…”
Section: Overview Of Ternary Logic and Cntfetmentioning
confidence: 99%