Effect of x-ray flux on polytetrafluoroethylene in x-ray photoelectron spectroscopy

Wheeler, Donald R.; Pepper, Stephen V.

doi:10.1116/1.571362

Cited by 105 publications

(49 citation statements)

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“…Such 2 Because degradation occurs under relatively mild conditions, it is always necessary to assure that the sample does not degrade significantly during data accumulation. [1][2][3] These studies showed that degradation proceeded in a similar fashion for all the Teflons so far mentioned, as follows: the scission of COC and COF bonds led to graphitization, crosslinking, and the loss of low-molecular weight species, as revealed by mass spectrometry. A decrease was seen in the amount of CF 2 , as was a gain in the amount of CF 3 ; this means that CF 2 • must have reacted with F• to produce substantial amounts of CF 3 .…”

Section: Introductionmentioning

confidence: 82%

Photodegradation of teflon AF1600 during XPS analysis

Popovici

Sacher

Meunier

1998

J. Appl. Polym. Sci.

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Teflon AF1600, containing perfluorinated dioxole rings, was found to be particularly susceptible to X-ray degradation, such as that occurring during X-ray photoelectron spectroscopy. Because of the presence of O, the degradation mechanism is substantially different from those of fluoropolymers containing only C and F. Each atom of a given element was found to have the same susceptibility to attack, irrespective of its position in the repeat unit, with O at least twice as susceptible as F. At any dose between 60 W* X-ray source power/5 min and 240 W/40 min, O was lost at an amount equal to that of F, which necessitated the breaking of two COO bonds; O also degraded by breaking only one bond, in which case the oxygen was not lost but formed a free radical. The free radicals produced by the homolytic scission of COC bonds participated in reactions leading to degradation and crosslinking. *The product of X-ray filament emission current and the potential difference between it and the X-ray anode.

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Section: Introductionmentioning

confidence: 82%

Photodegradation of teflon AF1600 during XPS analysis

Popovici

Sacher

Meunier

1998

J. Appl. Polym. Sci.

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“…The surface-treatment solution was prepared with hexane (guaranteed reagent; Kanto Chemicals) at a concentration of 0.1 mol l 1 . Highly polished silicon wafers with a naturally oxidized layer were used as the solid substrates for silane treatment.…”

Section: Experimental Preparation Of Organic Silane Monolayers On Silmentioning

confidence: 99%

Effect of oxide thickness on the degradation of organic silane monolayers on silicon wafer surface during XPS measurement

Sato

Furusawa

Hotta

et al. 2006

Surface & Interface Analysis

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Many organic materials are damaged and decompose by irradiation of X-rays during XPS measurements. Factors for the decomposition and/or degradation are considered to be X-ray, radiant heat and electrons from the X-ray source, photoelectrons and the inelastically scattered electrons from the sample itself, and so on. We have established the method to evaluate the effect of electrons from the sample by using various inorganic materials as substrates. In this paper, the effect of the thickness of surface oxide layer of silicon wafer on the scission of C-Cl and C-Br bonds in the organic silane monolayers on the wafer surface prepared from chloropropyltrimethoxysilane (CTMS) and bromopropyltrimethoxysilane (BTMS) modifiers has been investigated experimentally. The X-ray source was monochromatic Al Ka, which eliminates the effect of heat and the electrons from the X-ray source. Damaging factors evaluated from the decrease of peak intensity and the fitting to the 1st order reaction rate increased with the thickness of the oxide layer and saturated at about 7 nm. Consequently, the electrons from the sample are considered to be one of the main factors for sample degradation.

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“…It was the aim of this article to have been reported on X-ray-induced damage in examine the effect of the X-rays in XPS on the XPS analysis on different polymers. [3][4][5] In the case constitution of the PVDF surface using a specof polytetrafluoroethylene (Teflon), Wheeler and trometer with a nonmonochromatic MgKa X-ray Pepper, 4 using a nonmonochromatic MgKa X-ray source. We observed the time dependence of the source, showed that the polymer surface is deflushape, intensity, and binding energy of the C 1s orinated by X-rays rather than by electron bomand F 1s lines in the XPS spectrum, trying to unbardment used for the compensation of the surderstand the damage-responsible mechanism.…”

Section: Introductionmentioning

confidence: 99%