2008 20th International Symposium on Power Semiconductor Devices and IC's 2008
DOI: 10.1109/ispsd.2008.4538894
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Experimental Demonstration of 3.3kV Planar CIGBT In NPT Technology

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Cited by 17 publications
(4 citation statements)
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“…The device is fabricated on a 500 µm thick wafer with a doping profile shown in Figure 3b. A new proposed structure is inspired by the clustered IGBT (CIGBT) concept, schematically illustrated in Figure 4, which is promoted in reducing conduction losses with a simple application of two additional deep diffusions [8][9][10][11]. Regarding these additional layers there are four optimization parameters: doping concentration and thickness of the two new layers.…”
Section: Sscb Bespoke Optimizationmentioning
confidence: 99%
“…The device is fabricated on a 500 µm thick wafer with a doping profile shown in Figure 3b. A new proposed structure is inspired by the clustered IGBT (CIGBT) concept, schematically illustrated in Figure 4, which is promoted in reducing conduction losses with a simple application of two additional deep diffusions [8][9][10][11]. Regarding these additional layers there are four optimization parameters: doping concentration and thickness of the two new layers.…”
Section: Sscb Bespoke Optimizationmentioning
confidence: 99%
“…On the other hand, the short circuit capability of standard and dual EST structures is limited to very-low voltages in relation to the low-voltage MOSFET within the structure. However, a cascaded type EST [55] is capable of providing the short circuit capability www.ietdl.org but at the expense of lowering the plasma concentration with higher on-state losses due to a lower doped n-region in the integrated thyristor structure.…”
Section: Revisiting Mos Bipolar Device Conceptsmentioning
confidence: 99%
“…In this paper, we demonstrate the dynamic avalanche ruggedness of 3.3kV Field-Stop Clustered IGBT (CIGBT) [7][8][9][10] with self-voltage clamping capability. The technology shows improved safe and efficient operation and will ease the design constrictions on the system level.…”
Section: Introductionmentioning
confidence: 99%