2003
DOI: 10.1016/s0925-9635(03)00028-1
|View full text |Cite
|
Sign up to set email alerts
|

Fabrication of vertically aligned carbon nanostructures by microwave plasma-enhanced chemical vapor deposition

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
4
0

Year Published

2007
2007
2019
2019

Publication Types

Select...
8

Relationship

0
8

Authors

Journals

citations
Cited by 8 publications
(4 citation statements)
references
References 14 publications
0
4
0
Order By: Relevance
“…1,2) CNWs have unique physical, chemical, morphologic, and electrical properties and are used in a variety of applications, including fuel cells, gas sensors, gas storage, membranes for electrochemical energy storage (due to their large surface area), and field emitters (due to their high aspect ratio). [3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18][19] CNWs have attracted considerable attention recently as potential cell culture scaffolds.…”
mentioning
confidence: 99%
See 1 more Smart Citation
“…1,2) CNWs have unique physical, chemical, morphologic, and electrical properties and are used in a variety of applications, including fuel cells, gas sensors, gas storage, membranes for electrochemical energy storage (due to their large surface area), and field emitters (due to their high aspect ratio). [3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18][19] CNWs have attracted considerable attention recently as potential cell culture scaffolds.…”
mentioning
confidence: 99%
“…Details of the RI-PECVD system have been given in previous reports and recent reviews. [3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18][19] The flow rate of methane (CH 4 ) was 100 sccm, and that of hydrogen (H 2 ) was 50 sccm. The substrate temperature was 650 °C, and the total pressure was 1 Pa.…”
mentioning
confidence: 99%
“…15) In another approach, chemical vapor deposition (CVD) methods for carbon nanomaterial synthesis have been extensively reported. [16][17][18] For example, carbon nanowalls are nanographene sheets that stand vertically on a substrate by growth in low-pressure CH 4 =H 2 or C 2 F 6 =H 2 plasma at high temperatures; [19][20][21] these gas-phase processes have been successfully used to fabricate nanographene sheets or flakes. In contrast, few studies on the synthesis of graphene flakes at atmospheric pressure have been reported, such as with submerged discharges in liquids.…”
mentioning
confidence: 99%
“…[12][13][14] Various substrates including silicon, silicon oxides, and metals with no metal catalysts, such as nickel, iron, and cobalt were used. 15) In recent years, we have reported the highly reproducible growth of CNWs by plasma-enhanced chemical vapor deposition with radical injection (RI-PECVD) employing the C 2 F 6 and H 2 mixture plasma, and high controllability of their morphology and electrical properties. 16) Furthermore, it has also been found that CNWs have semiconducting properties.…”
mentioning
confidence: 99%