1983
DOI: 10.1002/pssa.2210760121
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Formation of semiconductor epitaxial films by pulse heating crystallization or regrowth

Abstract: The contemporary state and perspectives of methods used, namely thermodynamical and kinetical characteristics of amorphous film crystallization and regrowth processes by pulse (laser, electron beam, etc.) heating are considered. On the base of experimental data thermodynamical diagrams of the processes of normal and accelerated, explosive or shock, crystallization of amorphous film (in the solid state) or regrowth (through the liquid phase) are given. An analysis of the acting mechanism by comparing the waitin… Show more

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Cited by 15 publications
(1 citation statement)
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“…Because of the coexistence of melt and crystallites in zone C, the crystals grow to larger size. Given the fast change in crystallinity (see below), we must consider the mechanism of explosive crystallization (28) that is initiated in zone C and propagates out to create the larger area of fine-grained polycrystalline silicon, allowing for enhanced heat transport out of the hot center (23,24). In this way, a flattening of the heat profile can result in all modified areas falling below the threshold for further crystallization within a few microseconds, as observed.…”
Section: Crystallization Dynamics and Phase Transitionsmentioning
confidence: 99%
“…Because of the coexistence of melt and crystallites in zone C, the crystals grow to larger size. Given the fast change in crystallinity (see below), we must consider the mechanism of explosive crystallization (28) that is initiated in zone C and propagates out to create the larger area of fine-grained polycrystalline silicon, allowing for enhanced heat transport out of the hot center (23,24). In this way, a flattening of the heat profile can result in all modified areas falling below the threshold for further crystallization within a few microseconds, as observed.…”
Section: Crystallization Dynamics and Phase Transitionsmentioning
confidence: 99%