2010
DOI: 10.1016/j.jcrysgro.2010.02.015
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Ga assisted oxide desorption on GaAs(001) studied by scanning tunnelling microscopy

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Cited by 3 publications
(2 citation statements)
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References 16 publications
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“…The degas procedure entailed initial heating to T s ¼400 1C for 30 min, followed by a basic Ga assisted oxide removal step at T s ¼520 1C. Samples prepared in this manner have presented smooth as-cleaned surfaces negating the requirement for thick buffer layers [6]. The sample was then heated to T s ¼600 1C under an As 4 flux in line with conventional oxide removal.…”
Section: Methodsmentioning
confidence: 99%
“…The degas procedure entailed initial heating to T s ¼400 1C for 30 min, followed by a basic Ga assisted oxide removal step at T s ¼520 1C. Samples prepared in this manner have presented smooth as-cleaned surfaces negating the requirement for thick buffer layers [6]. The sample was then heated to T s ¼600 1C under an As 4 flux in line with conventional oxide removal.…”
Section: Methodsmentioning
confidence: 99%
“…which could start at 520 °C[38] and drives As 2 (or As 4 ) out of the surface, leaving mobile Ga atoms to diffuse toward Ga 2 O 3 and volatilize it according to[34,[39][40][41] …”
mentioning
confidence: 99%