High efficiency a-Si:H p-i-n solar cell using a SnO<sub>2</sub>/glass substrate

Iida, H.; Shiba, Naotaka; Mishuku, T.; Ito, Atsuo; Karasawa, H.; Yamanaka, Mitsuyuki; Hayashi, Yutaka

doi:10.1109/edl.1982.25503

Cited by 18 publications

(7 citation statements)

References 2 publications

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“…1) In particular, SnO 2 thin films are indispensable for solar cell applications as transparent electrodes. 2,3) Several microstructural research studies have been carried out on SnO 2 thin films for solar cell application, 4,5) but such polycrystalline films composed of columnar-shaped crystals and rough surfaces are not suitable for applications requiring higher crystallinity, such as fully integrated optical waveguide systems. 6,7) These applications naturally require the single-crystal-like quality of thin films and thus detailed understanding of lattice defects in rutile structures is essential to acquire the desired crystallinity.…”

Section: Introductionmentioning

confidence: 99%

Defect Structure of Heteroepitaxial SnO₂ Thin Films Grown on TiO₂ Substrates

Wakabayashi

Suzuki

Iwazaki

et al. 2001

Jpn. J. Appl. Phys.

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Heteroepitaxal SnO 2 thin films were grown on rutile (100) TiO 2 single crystal substrates by pulsed laser deposition. The defect structure and surface morphology were investigated by transmission electron microscopy, reflection high-energy electron diffraction, and atomic force microscopy. The misfit-induced large biaxial compressive stress in the 200-nm-thick SnO 2 thin film was almost fully relaxed to yield the high-density interfacial misfit dislocations and related planar defects. The misfit dislocation network on the hetero-interface consisted of two types of partial edge dislocations with Burgers vectors of 1/2 101 and 1/2 110 , which involved {101} and {010} planar defects formed in the film, respectively. The evolution of the surface morphology and cross-sectional structure for thinner films suggested that the introduction of such defects occurs at the early growth stage, due to large lattice misfit, and is strongly affected by point defect condensation.

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Section: Introductionmentioning

confidence: 99%

Defect Structure of Heteroepitaxial SnO₂ Thin Films Grown on TiO₂ Substrates

Wakabayashi

Suzuki

Iwazaki

et al. 2001

Jpn. J. Appl. Phys.

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“…SnO 2 having a wide gap of ϳ3.6 eV ͑Ref. 10͒ has been used as a transparent conducting electrode in solar cells 11 and gas sensors. 12 This compound has a rutile structure with octahedral coordination, which is similar to anatase TiO 2 .…”

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confidence: 99%

Rutile-type oxide-diluted magnetic semiconductor: Mn-doped SnO2

Kimura

Fukumura

Kawasaki

et al. 2002

Applied Physics Letters

210

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Epitaxial films of an oxide-diluted magnetic semiconductor with rutile structure, Mn-doped SnO2, have been fabricated by pulsed-laser deposition. As the Mn content increases, systematic changes in lattice constants and in-gap absorption are observed. Magnetization measurements show almost paramagnetic behavior. The injection of n-type carrier over 1020 cm−3 is achieved by Sb doping. A Sn0.95Mn0.05O2:Sb film shows giant positive magnetoresistance as large as 60% at 5 K.

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“…Figure 1 shows various light trapping surface morphologies for the TCO films. Figure 1(a) and 1(b) represents textured TCO surface morphologies of SnO 2 :F and ZnO:B films being employed by the Ashai-U research group [46,[56][57][58][59][60][61]. The ZnO:B films were grown by low pressure CVD (LP-CVD) from precursors of diethyl-zinc and H 2 O; the conductivity was easily controlled by using di-borane as the dopant source [58,59] [1,6,7].…”

Section: Textured Tco Surface Morphologiesmentioning

confidence: 99%

Plasma Textured Glass Surface Morphologies for Amorphous Silicon Thin Film Solar Cells-A review

Hussain

Balaji²,

Kim³

et al. 2016

Transactions on Electrical and Electronic Materials

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The surface morphology of the front transparent conductive oxide (TCO) films plays a vital role in amorphous silicon thin film solar cells (a-Si TFSCs) due to their high transparency, conductivity and excellent light scattering properties. Recently, plasma textured glass surface morphologies received much attention for light trapping in a-Si TFSCs. We report various plasma textured glass surface morphologies for the high efficiency of a-Si TFSCs. Plasma textured glass surface morphologies showed high rms roughness, haze ratio with micro-and nano size surface features and are proposed for future high efficiency of a-Si TFSCs.

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High efficiency a-Si:H p-i-n solar cell using a SnO₂/glass substrate

Cited by 18 publications

References 2 publications

Defect Structure of Heteroepitaxial SnO₂ Thin Films Grown on TiO₂ Substrates

Defect Structure of Heteroepitaxial SnO₂ Thin Films Grown on TiO₂ Substrates

Rutile-type oxide-diluted magnetic semiconductor: Mn-doped SnO2

Plasma Textured Glass Surface Morphologies for Amorphous Silicon Thin Film Solar Cells-A review

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High efficiency a-Si:H p-i-n solar cell using a SnO2/glass substrate

Cited by 18 publications

References 2 publications

Defect Structure of Heteroepitaxial SnO2 Thin Films Grown on TiO2 Substrates

Defect Structure of Heteroepitaxial SnO2 Thin Films Grown on TiO2 Substrates

Rutile-type oxide-diluted magnetic semiconductor: Mn-doped SnO2

Plasma Textured Glass Surface Morphologies for Amorphous Silicon Thin Film Solar Cells-A review

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High efficiency a-Si:H p-i-n solar cell using a SnO₂/glass substrate

Defect Structure of Heteroepitaxial SnO₂ Thin Films Grown on TiO₂ Substrates

Defect Structure of Heteroepitaxial SnO₂ Thin Films Grown on TiO₂ Substrates