2017
DOI: 10.1109/tcsii.2016.2642820
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High-Precision, Mixed-Signal Mismatch Measurement of Metal–Oxide–Metal Capacitors

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Cited by 7 publications
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“…From the confined areas shown in the plot, it becomes evident that an accurate BEOL fabrication process is required for highprecision analog computing. Advanced patterning techniques in deep submicron nodes allow to keep the mismatch below 0.05%, even for small C unit sizes [24]. Furthermore, matching will gradually improve in upcoming technologies since the metal fabrication precision is increasing as the transistors are shrinking in accordance with Moore's law [25], [26].…”
Section: F Noise and Mismatch Impactmentioning
confidence: 99%
“…From the confined areas shown in the plot, it becomes evident that an accurate BEOL fabrication process is required for highprecision analog computing. Advanced patterning techniques in deep submicron nodes allow to keep the mismatch below 0.05%, even for small C unit sizes [24]. Furthermore, matching will gradually improve in upcoming technologies since the metal fabrication precision is increasing as the transistors are shrinking in accordance with Moore's law [25], [26].…”
Section: F Noise and Mismatch Impactmentioning
confidence: 99%