2012
DOI: 10.1155/2012/723714
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In SituandEx SituStudies of Molybdenum Thin Films Deposited by rf and dc Magnetron Sputtering as a Back Contact for CIGS Solar Cells

Abstract: Molybdenum thin films were deposited by rf and dc magnetron sputtering and their properties analyzed with regards to their potential application as a back contact for CIGS solar cells. It is shown that both types of films tend to transition from tensile to compressive strain when the deposition pressure increases, while the conductivity and the grain size decreas. The nucleation of the films characterized byin situand real time spectroscopic ellipsometry shows that both films follow a Volmer-Weber growth, with… Show more

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Cited by 45 publications
(19 citation statements)
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“…As shown in TABLE I, the root-mean-square (RMS) surface roughness of the DC films and the RF films is 5.014 nm and 3.221 nm, respectively. This result is not in accordance with the data 13 reported in which the RF films have a wider particle size distribution. It may be explained that a rotating platform is used in the deposition chamber and the pressure and power remain unchanged in our experiment.…”
Section: Surface Morphologycontrasting
confidence: 99%
See 1 more Smart Citation
“…As shown in TABLE I, the root-mean-square (RMS) surface roughness of the DC films and the RF films is 5.014 nm and 3.221 nm, respectively. This result is not in accordance with the data 13 reported in which the RF films have a wider particle size distribution. It may be explained that a rotating platform is used in the deposition chamber and the pressure and power remain unchanged in our experiment.…”
Section: Surface Morphologycontrasting
confidence: 99%
“…7-9 P. Blosch et al reported that the molybdenum films were deposited on stainless steel foils. 10 13 The preparation of bilayer Mo films was reported and the adhesion of Mo film and substrate was solved. 8 However, the adhesion of Mo film and CIGS cells and the reflectivity of the back contact are also important parameters which have not been solved yet.…”
Section: Introductionmentioning
confidence: 99%
“…At lower working gas pressure (higher gas power), the atoms gain higher energy due to lesser scattering, and the atoms will then impact the substrate surface with sufficient energy which enhance the atoms mobility in order to facilitate atom diffusion and microvoid fill up, thus creating a conducive requirement for large grain growth and better crystallinity. The same crystallite behaviour was observed in RF sputtered films at low working pressure, but the degree of crystallization appeared to be lower as compared to the DC sputtered films [95,97]. This can be related to the deposition rate of both RF and DC sputtering technique.…”
Section: Different Deposition Techniques' Influence On the Propertiessupporting
confidence: 59%
“…In high power and low working pressure, the increase of Mo grain size causes space between grains to reduce and thus correlates well to the formation of densely packed Mo microstructure. Additionally, along all applied pressures, the grain size of DC sputtered Mo film is always larger than the RF sputtered Mo film [97]. One possible way to explain the formation of large grain size is probably higher power will induce higher flux, and high deposition rate of DC sputtering tends to increase the probability of the Mo particles to nucleate with each other.…”
Section: Different Deposition Techniques' Influence On the Propertiesmentioning
confidence: 99%
“…It has a variety of applications like material analysis, environmental monitoring, determination of soil contamination, and biomedical studies, etc. [1]- [3]. It employs a low-energy pulsed laser and a focusing lens to generate plasma on the surface of a target.…”
Section: Introductionmentioning
confidence: 99%