Illumination Condition And Mask Bias For 0.18/spl mu/m Pattern With KrF Lithography

Tabuchi, H.; Shichijo, Y.; Okabe, Ichiro; Oka, Naoki; Inoue, M.; Iguchi, K.

doi:10.1109/imnc.1998.729992

Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No 1998

DOI: 10.1109/imnc.1998.729992

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Illumination Condition And Mask Bias For 0.18/spl mu/m Pattern With KrF Lithography

H. Tabuchi¹,

Y. Shichijo²,

Ichiro Okabe³

et al.

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2016

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Sub-resolution-assist-feature placement study to dense patterns in advanced lithography process

Chen

Mao

et al. 2016

2016 China Semiconductor Technology International Conference (CSTIC)

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Sub-Resolution-Assist-Feature (SRAF) placement is an essential approach of Resolution Enhancement Technology (RET) [1], especially for technology node below 45nm. A lot of studies show SRAF can help to improve semi-dense and isolated patterns resolution and process window. However SRAF effect to dense pattern is rarely focused. The border line of the dense pattern is an isolated line on the outer direction. SRAF plays an important role not only to the border line, but also to the interior line beside the border line. In this paper, the SRAF effect to the dense pattern was analyzed. SRAF placement optimization experiments were carried out to a dense line pattern. From the experiments result, SRAF space affects the resolution of dense line pattern much more than SRAF width.The best SRAF space value has been recommended through experiment and optical intensity analysis.

show abstract

Sub-resolution-assist-feature placement study to dense patterns in advanced lithography process

Chen

Mao

et al. 2016

2016 China Semiconductor Technology International Conference (CSTIC)

View full text Add to dashboard Cite

show abstract

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Illumination Condition And Mask Bias For 0.18/spl mu/m Pattern With KrF Lithography

Cited by 1 publication

References 0 publications

Sub-resolution-assist-feature placement study to dense patterns in advanced lithography process

Sub-resolution-assist-feature placement study to dense patterns in advanced lithography process

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