2018
DOI: 10.1109/led.2018.2829925
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On-Chip High-Voltage Charge Pump With MEMS Post-Processed Standard 5-V CMOS on SOI for Electroosmotic Flow Micropumps

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Cited by 10 publications
(8 citation statements)
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“…5, where the body and source in each transistor are connected. In the previous work, we demonstrated an efficient HV generator using the MEMS post-processed transistors [45]. Although we have proved that a high-efficient HV generator can be designed by 5 V CMOS technology and the MEMS post-process, the experiment was performed using an external PDMS micro-channel and bulk Pt electrodes.…”
Section: Designmentioning
confidence: 98%
See 1 more Smart Citation
“…5, where the body and source in each transistor are connected. In the previous work, we demonstrated an efficient HV generator using the MEMS post-processed transistors [45]. Although we have proved that a high-efficient HV generator can be designed by 5 V CMOS technology and the MEMS post-process, the experiment was performed using an external PDMS micro-channel and bulk Pt electrodes.…”
Section: Designmentioning
confidence: 98%
“…2 becomes neglectable. In the experiment, we set the clock frequency to 20 MHz, since the previous study of driving an external EOF micropump in [45]…”
Section: A Integrated Hv Generatormentioning
confidence: 99%
“…If the size of the ESD protection and output filter is not considered, the implementations in [9], [14], [20] are of similar area as the charge pump cores of this work, but only achieve step-up ratios of respectively 3.2, 19, and 13.1, while also having a significantly higher input power. In [9], where no input power or efficiency specification was available, it must be assumed that the input power is at least the same as the output power, which is up to 44 times higher than the input power in this work.…”
Section: B Comparison With Prior Artmentioning
confidence: 99%
“…In [7], the breakdown limitation is sought circumvented through placing devices on top of the field oxide. In other literature, multi-chip solutions are proposed [8], and a range of studies [9]- [11] have used Silicon-On-Insulator (SOI) processes which feature high breakdown voltages. In this work, a 180 nm SOI process with devices having a breakdown voltage up to more than 200 V is used.…”
Section: Introductionmentioning
confidence: 99%
“…One approach is to use devices that can be implemented on top of the field oxide as the field oxide has a high breakdown voltage [4], another approach is to use multiple ASICs [5]. It is also possible to use processes that are designed for HV applications such as Silicon On Insulator (SOI) processes which has been the approach in [6], [7], [8].…”
Section: Introductionmentioning
confidence: 99%