Operation of spatial light modulators in DUV light

Dauderstaedt, Ulrike; Duerr, Peter; Krellmann, M.; Karlin, Tord; Berzinsh, U.; Leonardsson, Lars; Wendrock, H.

doi:10.1117/12.477805

Cited by 7 publications

(4 citation statements)

References 2 publications

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“…The last item is particularly important when the mirrors are operated in DUV light, where the ozone created by the light in combination with the electrical fields underneath the mirrors oxidized the surface of the address electrodes, leading to trapped charges in the oxide and thus a reduced electrostatic force acting on the mirrors; see [ 29 ].…”

Section: Fabricationmentioning

confidence: 99%

Analog Spatial Light Modulators Based on Micromirror Arrays

et al. 2021

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The Fraunhofer Institute for Photonic Microsystems (IPMS) has been developing and manufacturing micromirror arrays for more than 20 years. While originally focusing on applications related to microlithography and therefore mainly for light in the deep ultraviolet range, the range of applications has been expanded since, including applications in the visible and near-infrared range. This paper gives an overview of the devices and their designs, fabrication, and characterization.

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Section: Fabricationmentioning

confidence: 99%

Analog Spatial Light Modulators Based on Micromirror Arrays

et al. 2021

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“…The SLM is tailor made for mask writing and consists of a high voltage CMOS circuit with an integrated micromirror MEMS device on top [3][4]. It has electrostatic actuation of tilting micromirrors.…”

Section: Slm Technologymentioning

confidence: 99%

A high-end mask writer using a spatial light modulator

et al. 2005

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This paper presents the properties of the Sigma7300 which is a commercial DUV laser pattern generator based on spatial light modulator (SLM) technology designed to meet the requirements of the 65-nm technology node and below [1]. The introduction of spatial light modulators provides a possibility for optical mask writers to combine high resolution and accuracy with short write time making it possible to write most of the high end mask layers in a cost effective way. The Sigma7300 mask writer is developed by Micronic Laser Systems whereas the SLM, which is a combined MEMS and CMOS component with individually controllable movable micromirrors, is developed by the Fraunhofer-IPMS institute in Dresden. The SLM allows parallel writing of one million pixels with a frame rate of up to 2 kHz. The technology offers resolution enhancement advantages from stepper technology not available in other mask patterning tools [2].

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“…Fruitful technological advances had been made by various research teams, spanning a wide range of technical fields from system-level architecture, data compression and decompression, storage/interface circuit design, imaging strategy and optimization, [8][9][10][11][12][13][14][15][16][17][18][19][20][21][22][23][24][25][26] to dynamics, control and fabrication of micromirror devices. [27][28][29][30][31][32][33][34][35][36][37][38][39][40][41][42][43][44][45] Unfortunately, the university research funding dropped in a time frame of one to two years (2006)(2007), resulting in significantly slowed progress and even technological stagnation which were reflected in overall reduction of publication activity in projection maskless lithography after 2007. Although research teams from Micronic, ASML, Bell Lab, and Imec continued to make technical contributions, most of them were targeted at DUV wavelength.…”

Section: Introductionmentioning

confidence: 99%

“…Optical direct writing and display systems based on MEMS spatial light modulator (SLM) technology have been extensively researched before. [34][35][36][37][38][39][40][56][57][58][59] The main challenge to extend them to EUV wavelength is the lack of EUV writing engine which is beyond the scope of current MEMS research. The mirror sizes reported in previous literatures are one order of magnitude larger than what is required by maskless EUV lithography.…”

Section: Introductionmentioning

confidence: 99%

Past progress, current status, and future perspective of digital EUV lithography for high-resolution semiconductor manufacturing

Chen,

Song,

Gao

et al. 2024

Novel Patterning Technologies 2024

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In this paper, a general review of the past progress, current status and future perspective of MEMS/NEMS based maskless EUV digital lithography for high-resolution semiconductor manufacturing is presented. Starting from the maskless patterning resolution and throughput requirements, we shall discuss the unique characteristics of digital EUV lithography spanning from optical and system-level design, imaging methodology, writing engine, to device process development and fabrication progress achieved. The wafer scan induced image blur impacts maskless writing speed and imaging strategy. The required high demagnification and redundant multiple-pulse exposure help to enable the defect-tolerant printing. Digital EUV lithography allows multiple/sequential stitching exposures in one scanning process without throughput penalty, thus can simplify the patterning process and amplify its competitiveness in high-NA application. Moreover, its grayscale/analog imaging principle not only significantly reduces the data rate but also provides an efficient way to enhance the resolution capability. Dynamics, control and design of electrically damped MEMS/NEMS devices will be examined. A low-temperature LPCVD SiGe process for MEMS/IC integration has been developed and the micromirror fabrication results will be reviewed. It is shown that reflective nanomirrors based maskless approach is one path to cost-effective and defect-tolerant compact EUV lithography, which helps to create emerging opportunities for low-volume but cutting-edge IC applications. Potential processing challenges and scaling issues of nanomirror device technology for a timely insertion of digital EUV lithography into future advanced IC manufacturing will also be discussed.

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Operation of spatial light modulators in DUV light

Cited by 7 publications

References 2 publications

Analog Spatial Light Modulators Based on Micromirror Arrays

Analog Spatial Light Modulators Based on Micromirror Arrays

A high-end mask writer using a spatial light modulator

Past progress, current status, and future perspective of digital EUV lithography for high-resolution semiconductor manufacturing

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