Photo-mask fabrication by low-energy microcolumn lithography

Kim, H. S.; Ahn, Sung-Ho; Kim, D. W.; Kim, Y. C.

doi:10.1016/j.mee.2008.12.097

Cited by 6 publications

(1 citation statement)

References 7 publications

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“…The critical dimensions of thin-film hybrid electronic microcircuits and microwave circuits / antennas are often much larger than tens of micrometers and require fabrication accuracy in the range of a few micrometers. Such features are extremely easy to achieve using classical semiconductor fabrication technology (Kim et al, 2008;Kim et al, 2009) based on a mask aligner and rigid photomasks. The latter are made of thin chromium film with high cohesion strength deposited on borosilicate glass or fused quartz (Wang et al, 2012).…”

Section: Introductionmentioning

confidence: 99%

Low-cost photomask fabrication using laser ablation

Legeay

Castel

Benzerga

et al. 2015

Journal of Materials Processing Technology

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A specific fabrication process has been developed to produce low-cost photomasks using standard consumer products. This process is based on an indirect route, using a numerically-controlled excimer laser (KrF) etching technique. It begins with RF-sputtering deposition of a titanium film (200 nm-thick) on float glass substrate. Then a nitrocellulose lacquer, serving as a self-developing resist, is spin-coated on titanium. It is ablated with partially-overlapping laser impacts and undergoes self-combustion under laser beam. Proper heat treatments are applied before and after laser ablation to circumvent smearing and adhesion problems. Finally the titanium layer is wet etched through the openings in the resist by dilute hydrofluoric acid. Both nitrocellulose lacquer characterization and laser parameters are discussed. The resolution achieved here (10 µm, limited by diffraction effects of the laser optics and by side heating of the resist due to the titanium film) is suitable for the fabrication of microwave devices.To confirm the suitability of the proposed process, several photomasks have been fabricated to pattern coplanar tunable stub resonators on ferroelectric KTa 0.5 Nb 0.5 O 3 thin films. The dielectric permittivity of the KTa 0.5 Nb 0.5 O 3 material is controlled by DC biasing. A 18 % tunability of the stub resonance frequency has been measured in X-band (close to 10 GHz), validating thereby the whole patterning process.

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Section: Introductionmentioning

confidence: 99%