Photosensitive polynorbornene based dielectric. I. Structure–property relationships

Abstract

ABSTRACT:In the microelectronics industry, the drive for increasing device speed, level of functionality and shrinking size has placed significant demands on the performance characteristics of polymer dielectrics. In this study, a negative acting, photodefinable dielectric formulation based on a copolymer of decylnorborne (decylNB) and epoxynorbornene (AGENB) was investigated for use in electronics packaging. The structure-property relations of this copolymer were investigated. Copolymer composition and processing conditions were shown to significantly affect the properties of the final polymer films. A lower content of AGENB results in lower moisture absorption, dielectric constant, modulus and residual stress, but it compromises multilayer capability. High crosslink density lowers the dielectric constant but increases the modulus and residual stress.

Aqueous-Develop, Photosensitive Polynorbornene Dielectric: Properties and Characterization

“…In the unexposed Avatrel 8000P sample, a high concentration of unreacted epoxy groups resulted in an increase of overall dipole polarization and permittivity. 4 The dielectric constant of fully cured Avatrel 2000P is 2.55 30 and the dielectric constant of SU-8 is 3.2, 14 which are both lower than the dielectric constant of Avatrel 8000P. The higher dielectric constant of Avatrel 8000P is first attributed to its polarizable side-groups: the fluorinated alcohol group and the carboxylic acid groups.…”

“…Avatrel 2000P was processed according to the procedures of Bai et al, 3,4 and SU-8 was processed according to the procedures listed on the MicroChem website. 14 Avatrel 8000P samples were spin-coated onto h100i silicon wafers and then softbaked on a hotplate at 100°C for 5 min to remove the solvent from the polymer film.…”

“…Extensive research has been conducted to establish structure-property relationships with epoxy-based polymers such as Avatrel Ò 2000P (Promerus LLC) and SU-8 (MicroChem). [1][2][3][4][5] Avatrel 2000P is a copolymer of alkyl norbornene and epoxide-functionalized norbornene monomers, as shown in Fig. 1.…”

“…The alkyl side-groups have been shown to lower the elastic modulus and increase the elongation to break, and the epoxide side-groups provide crosslinkable sites, increase adhesion characteristics, and increase elastic modulus. 4 SU-8, shown in Fig. 2, is an epoxy-based resin initially developed by IBM and designed for microelectromechanical systems (MEMS).…”

Chiral Mn(III) salen catalyzed oxidation of hydrocarbons

“…The rationale behind the choice of norbornene as substrate is based on the wide applicability of norbornene and its derivatives like epoxy norborane, diol etc., in polymer synthesis, pharmaceutical intermediates and general organic synthesis [22]. The probable products during the oxidation of norbornene include 2,3-epoxynorborane, 2-norbornanone and exo, endo-norborneols.…”