2003
DOI: 10.1016/s1386-9477(02)00645-8
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Si1−xGex/Si multi-quantum well phototransistor for near-infrared operation

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Cited by 7 publications
(3 citation statements)
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“…The carbon-doped or undulating growth technique can also be applied in the SL to further increase its critical thickness [23], [25], [26], [34]. The composition of the simulated SL is Si Ge -Si to achieve an appropriate value of the optical absorption constant (100 cm ) in the long-wavelength regime ( 1.3 m) [17], [26]. In traditional separate-absorption-charge-multiplication (SACM) APDs, the photoabsorption layers are lightly and uniformly doped.…”
Section: Device Structurementioning
confidence: 99%
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“…The carbon-doped or undulating growth technique can also be applied in the SL to further increase its critical thickness [23], [25], [26], [34]. The composition of the simulated SL is Si Ge -Si to achieve an appropriate value of the optical absorption constant (100 cm ) in the long-wavelength regime ( 1.3 m) [17], [26]. In traditional separate-absorption-charge-multiplication (SACM) APDs, the photoabsorption layers are lightly and uniformly doped.…”
Section: Device Structurementioning
confidence: 99%
“…The modeled epilayer structures of APDs are Si-based with an SiGe-Si superlattice (SL) photoabsorption layer for telecommunication wavelength (1. 3 1.55 m) applications [17], [18]. Conventional Si-based APDs exhibit much lower multiplication noise, shorter multiplication time, and larger gain-bandwidth product [7], [8], [19] than III-V-based APDs, because Si has very dissimilar electron ( ) and hole ( ) impact ionization coefficients, and the ratio (…”
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confidence: 99%
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