Spray coating of PMMA for pattern transfer via electron beam lithography on surfaces with high topography

Linden, J.L.; Thanner, Ch.; Schaaf, Benjamin; Wolff, Sandra; Lägel, B.; Oesterschulze, E.

doi:10.1016/j.mee.2010.12.106

Cited by 26 publications

(15 citation statements)

References 6 publications

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“…8 The spray coating method is particularly suitable for sharp substrate features including deep trenches, but it requires special spray coating equipment and a complex optimized mixture of PMMA with acetate and ketone to facilitate vaporization during the coating process. 5 Thermal evaporation of polystyrene (PR) has been recently used in ebeam lithography to achieve 15 nm resolution, but generally, PR has poor exposure sensitivity compared to PMMA and thermal evaporation equipment adds complexity and cost to the process. Ice resist has been applied to fragile and nonplanar substrates such as carbon nanotubes, but this method requires specially designed e-beam lithography and e-beam evaporation systems to maintain the temperature < 120 K, 8 thereby increasing cost and limiting the selection of target substrates.…”

Section: Facile Electron-beam Lithography Technique For Irregular Andmentioning

confidence: 99%

Facile electron-beam lithography technique for irregular and fragile substrates

Chang

Zhou

Zettl

2014

Applied Physics Letters

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A facile technique is presented which enables high-resolution electron beam lithography on irregularly-shaped, non-planar or fragile substrates such as the edges of a silicon chip, thin and narrow suspended beams and bridges, or small cylindrical wires. The method involves a spin-free dry-transfer of pre-formed uniform-thickness polymethyl methacrylate, followed by conventional electron beam writing, metal deposition, and lift-off. High-resolution patterning is demonstrated for challenging target substrates. The technique should find broad application in micro- and nano-technology research arenas.

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Section: Facile Electron-beam Lithography Technique For Irregular Andmentioning

confidence: 99%

Facile electron-beam lithography technique for irregular and fragile substrates

Chang

Zhou

Zettl

2014

Applied Physics Letters

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“…Several resist coating methods for unconventional substrates have been demonstrated, including ice lithography, , evaporative resists, , spray coating, spin coating using low-viscosity resists, , float coating, and dip coating . In ice lithography, water ice deposited on substrates is used as an e-beam resist.…”

Section: Introductionmentioning

confidence: 99%

Single Layer Surface-Grafted PMMA as a Negative-Tone e-Beam Resist

et al. 2017

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One of the important challenges in electron beam lithography is nanofabrication on nonflat or irregular surfaces. Although spin coating is the most popular technique for resist coating, it is not suitable for nonflat, irregular substrates because a uniform film cannot be achieved on those surfaces. Here, it is demonstrated that single layer surface-grafted PMMA can be used as a negative-tone e-beam resist, and it can be applied to nonflat, irregular surfaces as well as flat, conventional surfaces. Although it is well known that heavily exposed PMMA undergoes cross-linking and works as a negative-tone e-beam resist when developed by solvent, solvent does not work as a developer for negative-tone single-layer surface-grafted PMMA. Instead, thermal treatment at 360 °C for 1 min is used to develop PMMA.

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“…However, standard spin-coating technique fails to pattern non-planar surfaces and cannot cover pre-structured substrates with resist uniformly. A possible solution is offered by alternative methods of resist deposition, such as resist evaporation [4], spray coating [5] or ice (H 2 O) lithography [6]. Nevertheless, these are mostly laborious processes and require special equipment.…”

Section: Introductionmentioning

confidence: 99%

Study of Magnetic Micro-Ellipses by Cantilever Sensor

et al. 2017

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In this paper, we propose a method for prototyping cantilever sensors by means of a modification of commercial atomic force microscopy cantilevers, using electron beam lithography and focused ion beam milling. To overcome obstacles with resist coating related to spin-coating of nonplanar 3D substrates, in this case of free-standing cantilevers, we propose a modified method based on spin-coating technique. An auxiliary atomic force microscopy chip was inserted below the cantilever to quasi-planarize the surface during spin-coating of electron beam resist. Magnetic micro-ellipses were prepared at the free-end of the cantilever by electron beam lithography. We propose a design of a cantilever sensor for the study of magnetic coupling between two cantilevers, prepared by focused ion beam milling. In ideal case, the coupling could be detected by a shift in resonance peaks. Attractive and repulsive forces between magnetic structures were shown by magnetic force microscopy.

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Spray coating of PMMA for pattern transfer via electron beam lithography on surfaces with high topography

Cited by 26 publications

References 6 publications

Facile electron-beam lithography technique for irregular and fragile substrates

Facile electron-beam lithography technique for irregular and fragile substrates

Single Layer Surface-Grafted PMMA as a Negative-Tone e-Beam Resist

Study of Magnetic Micro-Ellipses by Cantilever Sensor

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