The effect of Ehrlich–Schwoebel step-edge barrier on the formation of self-organized Si nanodots by ion-sputter erosion

Scanning probe characterization of enzymes deposited onto step-bunched silicon nanostructures

“…This indicates that an internal dipole moment of the molecules does not strongly contribute to the adsorption process. The finding that the molecules appear on top of the terraces near their edges and on the (100) facettes as well shows that a Schwöbel-Ehrlich barrier [15,16] does not contribute significantly to the adsorption process either, as has already been stated for accumulation layers [17].…”