2012
DOI: 10.1088/0022-3727/45/31/315101
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The work function of n-ZnO deduced from heterojunctions with Si prepared by ALD

Abstract: Highly doped n-type ZnO films have been grown on n-type and p-type Si substrates by atomic layer deposition (ALD). Transmission electron microscopy shows columnar growth of the ZnO films with randomly oriented grains and a very thin interfacial layer of SiO x (x ⩽ 2) with a thickness below 0.4 nm to the Si substrate. Current–voltage and capacitance–voltage measurements performed at temperatures from 50 to 300 K reveal a strong rectifying behaviour on both types of substra… Show more

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Cited by 37 publications
(23 citation statements)
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“…3 we compare our estimate ðΦ p − Φ n Þ=2 ¼ −0.084 eV to the expectations for Fermi-level pinning at the charge neutrality level (CNL), for an idealized Schottky junction (electron affinity alignment), and to previously published results on metal/Si and ZnO/Si diodes [5,[32][33][34][35]. With the exception of Ca, AZO/Si, and metal/Si diodes all exhibit Φ n > Φ p , meaning that the Fermi level at the interface is in the lower half of the Si band gap.…”
Section: Resultssupporting
confidence: 59%
See 1 more Smart Citation
“…3 we compare our estimate ðΦ p − Φ n Þ=2 ¼ −0.084 eV to the expectations for Fermi-level pinning at the charge neutrality level (CNL), for an idealized Schottky junction (electron affinity alignment), and to previously published results on metal/Si and ZnO/Si diodes [5,[32][33][34][35]. With the exception of Ca, AZO/Si, and metal/Si diodes all exhibit Φ n > Φ p , meaning that the Fermi level at the interface is in the lower half of the Si band gap.…”
Section: Resultssupporting
confidence: 59%
“…2), but these trends are overwhelmed by the change in band alignment on going from ZnO to AZO as seen by comparing our results to those of Refs. [33][34][35] (Fig. 3).…”
Section: Discussionmentioning
confidence: 97%
“…The electron affinitiy of Si is 4.05 eV, but for ZnO the values are more uncertain. Jacobi et al 4 reported 3.85–4.5 eV depending on annealing time, while a more recent study by Quemener et al 5 reported ∼4.6 eV. Aranovich et al 6 used a value of 4.35 eV, and this value is also assumed herein.…”
Section: Introductionmentioning
confidence: 91%
“…were used in this case. By knowing p Si and n Zn(1 À x)MgxO, δ Si and δ Zn(1 À x)MgxO have been evaluated through inverting the carrier concentration versus δ Si and δ Zn(1 À x) MgxO in the formulae for a non-degenerate and degenerate semiconductor, that are respectively: [21,22]. Here, it is also important to point out that the decrease of (0.157 0.06) eV for ΔE C is in agreement with the expected theoretically value of $ 0.1 eV.…”
Section: Device Characteristics and Band Alignment Versus Mg Contentmentioning
confidence: 99%