Thermal stability of Mo/Si multilayers with boron carbide interlayers

Böttger, Thomas; Meyer, Dirk C.; Paufler, P.; Braun, Stefan; Moss, Matthew; Mai, H.; Beyer, Eckhard

doi:10.1016/s0040-6090(03)01028-9

Cited by 56 publications

(28 citation statements)

References 19 publications

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“…Therefore, more chemically stable MLMs with diffusion barriers replace the standard Mo/Si MLMs as the base MLM stack [18][19][20][21]. In the simulation, SrTiO 3 (STO), SrRuO 3 (SRO) and PbZr 0.2 Ti 0.8 O 3 (PZT) were used as the buffer, electrodes, and piezoelectric layers, respectively.…”

Section: Active Mlm Structurementioning

confidence: 99%

Active multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths

Bayraktar

Wessels

Lee

et al. 2012

J. Phys. D: Appl. Phys.

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We propose an active multilayer mirror structure for extreme ultraviolet (EUV) wavelengths, which can be adjusted to compensate for reflectance changes. The multilayer structure tunes the reflectance via an integrated piezoelectric layer that can change its dimension due to an externally applied voltage. Here, we present design and optimization of the mirror structure for maximum reflectance tuning. In addition, we present preliminary results showing that the deposition of piezoelectric thin films with the requisite layer smoothness and crystal structure is possible. Finally piezoelectric coefficient measurement (d 33 = 60 pm V−1) of the film is presented.

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Section: Active Mlm Structurementioning

confidence: 99%

Active multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths

Bayraktar

Wessels

Lee

et al. 2012

J. Phys. D: Appl. Phys.

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“…Loss of reflectivity and interdiffusion between materials has been observed in Mo/Si systems during heat treatment. An interlayer of B 4 C [5,6] was deposited between Mo and Si layers to overcome the formation of molybdenum silicide layers. Other systems such as metal/Al 2 O 3 [7] or Ni/C [8] have been investigated and similar phenomena were observed.…”

Section: Introductionmentioning

confidence: 99%

In situ study of multilayer reflectivity upon heat treatment under synchrotron radiation

Borel

Morawe

Ziegler

et al. 2005

Laser-Generated, Synchrotron, and Other Laboratory X-Ray and EUV Sources, Optics, and Applications II

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Periodic multilayers deposited by Distributed Electron Cyclotron Resonance (DECR) sputtering were studied with synchrotron radiation at the ESRF bending magnet beam line BM5. In situ reflectivity measurements at a photon energy of 20keV have been carried out on these samples during a specific heat treatment. A dedicated furnace has been developed to heat the multilayers under vacuum from room temperature up to 550°C. [Ru/B 4 C] 70 and [W/B 4 C] 40 samples with repetition periods of about 4nm were chosen. Simulations of reflectivity measurements were performed to understand the evolution of layer thicknesses and interface widths. Additional ex-situ reflectivity measurements were done at 8keV before and after the annealing experiments to investigate irreversible effects. We will discuss the heat impact on the layered structure and in which way multilayer optics could be thermally pre-treated before their installation on synchrotron beam lines.

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“…26,49 Numerous studies investigated the thermal stability of Mo-Si MLs that operate in the EUV region. 38,[50][51][52][53][54][55][56][57][58][59] The MLs were exposed to high temperatures either to study the kinetics of silicide formation, [60][61][62] to control the growth and optimize ML fabrication, 52,54,62,63 or to reduce stress in the MLs. 55,56,64,65 Structural changes in Mo-Si MLs due to increased temperature are of great importance for lithography applications due to the stringent requirements for reflectance and wavelength stability and figure errors due to stress changes in the MLs.…”

Section: D5 High Reflectivity Low Stress and Thermal Stability Comentioning

confidence: 99%