Significant new mechanical and electronic phenomena can arise in single-crystal semiconductors when their thickness reaches nanometer dimensions, where the two surfaces of the crystal are physically close enough to each other that what happens at one surface influences what happens at the other. We show experimentally that, in silicon nanomembranes, through-membrane elastic interactions cause the double-sided ordering of epitaxially grown nanostressors that locally and periodically highly strains the membrane, leading to a strain lattice. Because strain influences band structure, we create a periodic band gap modulation, up to 20% of the band gap, effectively an electronic superlattice. Our calculations demonstrate that discrete minibands can form in the potential wells of an electronic superlattice generated by Ge nanostressors on a sufficiently thin Si(001) nanomembrane at the temperature of 77 K. We predict that it is possible to observe discrete minibands in Si nanoribbons at room temperature if nanostressors of a different material are grown.
As semiconductor devices scale to new dimensions, the materials and designs become more dependent on atomic details. NEMO5 is a nanoelectronics modeling package designed for comprehending the critical multi-scale, multi-physics phenomena through efficient computational approaches and quantitatively modeling new generations of nanoelectronic devices as well as predicting novel device architectures and phenomena. This article seeks to provide updates on the current status of the tool and new functionality, including advances in quantum transport simulations and with materials such as metals, topological insulators, and piezoelectrics.
Scaling transistors’ dimensions has been the thrust for the semiconductor industry in the last four decades. However, scaling channel lengths beyond 10 nm has become exceptionally challenging due to the direct tunneling between source and drain which degrades gate control, switching functionality, and worsens power dissipation. Fortunately, the emergence of novel classes of materials with exotic properties in recent times has opened up new avenues in device design. Here, we show that by using channel materials with an anisotropic effective mass, the channel can be scaled down to 1 nm and still provide an excellent switching performance in phosphorene nanoribbon MOSFETs. To solve power consumption challenge besides dimension scaling in conventional transistors, a novel tunnel transistor is proposed which takes advantage of anisotropic mass in both ON- and OFF-state of the operation. Full-band atomistic quantum transport simulations of phosphorene nanoribbon MOSFETs and TFETs based on the new design have been performed as a proof.
The design of electromagnetic invisibility cloaks is based on singular mappings prescribing zero or infinite values for material parameters on the inner surface of the cloak. Since this is only approximately feasible, an asymptotic analysis is necessary for a sound description of cloaks. We adopt a simple and effective approach for analyzing electromagnetic cloaks - instead of the originally proposed singular mapping, nonsingular mappings asymptotically approaching the ideal one are considered. Scattering and radiation from this type of imperfect cylindrical cloaks is solved analytically and the results are confirmed by full-wave finite element simulations. Our analysis sheds more light on the influence of this kind of imperfection on the cloaking performance and further explores the physics of cloaking devices.
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