We report on the lattice relaxation mechanism of ZnO films grown on c-Al2O3 substrates by plasma-assisted molecular-beam epitaxy. The lattice relaxation of ZnO films with various thicknesses up to 2000nm is investigated by using both in situ time-resolved reflection high energy electron diffraction observation during the initial growth and absolute lattice constant measurements (Bond method) for grown films. The residual strain in the films is explained in terms of lattice misfit relaxation (compression) at the growth temperature and thermal stress (tension) due to the difference of growth and measurement temperatures. In thick films (>1μm), the residual tensile strain begins to relax by bending and microcrack formation.
Ultraviolet anti-Stokes photoluminescence (ASPL) is observed under continuous visible
light excitation in a GaN single crystal at 4 and 77 K. The ASPL spectra are almost the
same as the Stokes photoluminescence (SPL) spectra under band-to-band excitation.
Namely, we observe ASPL due to bound and free excitons at 4 and 77 K, respectively.
Based on the temporal decay, the excitation spectrum and the excitation intensity
dependence of the ASPL intensity, we propose a two-step two-photon absorption
mechanism through an electron trapped at a deep ionized donor with a lifetime of 1.45 ms.
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