The control of water vapor (moisture) contamination in process gases is critical to the successful manufacture of semiconductor devices. As specified moisture levels have become more stringent, there is a growing demand for more sensitive analytical methods. Instrumental methods currently being used or in development for measuring trace moisture at ppbv levels include Fourier transform infrared spectroscopy, tunable diode laser absorption spectroscopy, cavity ringdown spectroscopy, intracavity laser spectroscopy, electron impact ionization mass spectrometry, and atmospheric pressure ionization mass spectrometry. In addition, sensor-based technologies such as oscillating quartz crystal microbalances, and chilled mirror-, capacitor-, and electrolytic-based hygrometers operate in this regime. These approaches are presented and reviewed. As the success of each trace moisture method is dependent on the degree to which the different process gases interfere with the measurement process, important process gas applications of the techniques are highlighted. Advantages and disadvantages as well as future developments and trends are also presented.

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Cavity-enhanced direct frequency comb spectroscopy (CE-DFCSfor trace water doped in arsine.