A comparative study of the physical properties of undoped, nonstoichiometric SnO, films on glass and quartz substrate is presented. With increasing film thickness, the crystallinity improves, the preferred orientation of the grains changes from the [loll to the [200] direction, and the carrier concentration decreases. The highest conductivity and mobility obtained are 2.5 x 10, W' cm-l and 13 cmZ/V s, respectively, for films on glass and 6.0 x 10' 0-' cmand 44 cm2/V s, respectively, for films on quartz substrate. It is indicated that the diffusion of alkali metal ions degrades the properties of the films deposited on glass substrate. The scattering mechanism in the films is also investigated. The figure of merit values obtained on glass (3.1 x a-') are amongst the highest values reported for undoped SnO, films. Es wird eine vergleichende Untersuchung der physikalischen Eigenschaften von undotierten, nichtstochiometrischen Sn0,-Schichten auf Glas-und Quarzsubstraten durchgefuhrt. Mit wachsender Schichtdicke verbessert sich die Kristallinitat, die bevorzugte Orientierung der Korner andert sich von der [loll-zur [200]-Richtung und die Tragerkonzentration nimmt ab. Die hochste erhaltene Leitfahigkeit und Beweglichkeit betragt 2,5 x 10' !X' cm-' bzw. 13 cmZ/V s fur Schichten auf Glas und 6,O x 10' Rcm-' bzw. 44 cmZ/V s fur Schichten auf Quarzsubstraten. Es wird gezeigt, daB die Diffusion von Alkalimetallionen die Eigenschaften der auf Glassubstrate abgeschiedenen Schichten degradiert. Der Streumechanismus in diesen Schichten wird ebenfalls untersucht. Die auf Glas (3,l x n-')-Substraten erhaltenen Wirkungsgrade liegen zwischen den hochsten fur undotierte Sn0,-Schichten angegebenen Werten.
The effect of the thickness‐dependent carrier concentration of degenerate tin‐oxide (SnO2) films on the optical parameters, e.g. refractive index (n), extinction coefficient (k), real part (ϵ′) and imaginary part (ϵ″) of the dielectric constant, are studied in the near‐infrared region. The dependence of the high‐frequency dielectric constant, the plasma frequency, and the conduction band effective mass on the carrier concentration is also studied and the results are compared with other papers on doped samples prepared by different methods.
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