Articles you may be interested inThe influence of underlying metals on the hydrogen evolution from plasmadeposited silicon nitride films J. Appl. Phys. 71, 958 (1992); 10.1063/1.351321Structure and optical properties of plasmadeposited fluorinated silicon nitride thin films

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It is found that the properties of silicon nitride (prepared from dilute (I)/NH3 plasmas) and carbonitride (dilute (I)/H2 plasmas) films critically depend on the ratio of RF power density to the (Me2Si‐NH)3 (I) flow rate, W/Fm.

ation and oxidation, which will subsequently lead to different compositions of the nitrided oxide films. Based on the multilayer model a simulation program for the nitridation kinetics has been developed ( 17) and the simulated nitrogen profiles agree qualitatively with experimental results under different processing conditions.

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