2008
DOI: 10.1088/1742-6596/114/1/012048
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Effect of substrate temperature on structural properties of thermally evaporated ZnSe thin films of different thickness

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Cited by 8 publications
(4 citation statements)
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“…Zinc selenide has a dense and flat microstructure with a grain size between 10 and 15 nm ( Fig. 9.e) which is in accordance with values reported in [52] for thermally grown zinc selenide at 100°C. It has been also demonstrated in [53,63] that smaller grain size induces a shift of the absorption edge to shorter wavelengths.…”
Section: Surface Roughnesssupporting
confidence: 89%
See 1 more Smart Citation
“…Zinc selenide has a dense and flat microstructure with a grain size between 10 and 15 nm ( Fig. 9.e) which is in accordance with values reported in [52] for thermally grown zinc selenide at 100°C. It has been also demonstrated in [53,63] that smaller grain size induces a shift of the absorption edge to shorter wavelengths.…”
Section: Surface Roughnesssupporting
confidence: 89%
“…At 500 nm wavelength, the extinction coefficient k of zinc selenide is equal to 10 −2 . At a substrate temperature equal to 100°C, zinc selenide high absorption is explained by the coating low crystallinity [52] which causes a shift of the absorption to shorter wavelengths [53]; the coating absorptance edge is at 2.3 eV which corresponds to about 550 nm. This is also the case for zinc sulphide.…”
Section: Extinction Coefficient Kmentioning
confidence: 99%
“…Moreover, the resistivity ( ρ ) of the deposited TF is around 10 5 Ωm. These consequences are analogous to previously reported values (10 6 –10 14 Ωm) [ 58 , 59 ]. The greater value of ρ may be ascribed by the nano crystallinity of TF, grain edge gaps, existence of exterior states and lesser d of the film signifying the suitability of the PZS and CDZS namely buffer layer in the TF technology [ 60 ].…”
Section: Resultssupporting
confidence: 92%
“…The film thickness has a strong influence on the band gap, surface roughness, optical and electrical properties. Because of these reasons, there have been many studies about the film thickness using various ways such as profilometer [1][2][3][4][5][6][7], ellipsometer [8], auger electron spectroscopy [9], interferometric method [10][11][12][13], weight-difference method [14][15], gravimetric method [16], stylus technique [17], Taylor-Hobson system [18], Fizzau method [19] and atomic force microscopy [20][21][22][23].…”
Section: Introductionmentioning
confidence: 99%