1992
DOI: 10.1063/1.351658
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Lateral spreading of focused ion-beam-induced damage

Abstract: We study the lateral spreading of implantation-induced damage and measure the position dependence of the cathodoluminescence intensity of GaAs/AlAs heterostructures patterned by a focused Ga+ ion beam. Two luminescence lines, one from a buried AlGaAs/GaAs quantum well and the other from a deeper lying AlAs/GaAs short period superlattice are detected. Implantation doses in the range 1012–1015 cm−2 are investigated. We find that the lateral spreading of implantation induced damage considerably exceeds the implan… Show more

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Cited by 26 publications
(8 citation statements)
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“…Furthermore, CL images are used to determine the beam shape, using a dip in the CL image induced by a line scan of the FIB across an n‐GaAs wafer (Itoh et al , 1998). Finally, characterization by CL is used to examine damage created by the FIB (Bever et al , 1992; Vetterli et al , 1995; Furuya & Saito, 1996; Endo et al , 2001). Clearly, the damage introduced by the FIB must be taken into account for FIB‐SEM tomography, as this damage may affect the CL emission and spectral features (Sahoo et al , 2004; Watanabe et al , 2007).…”
Section: Introductionmentioning
confidence: 99%
“…Furthermore, CL images are used to determine the beam shape, using a dip in the CL image induced by a line scan of the FIB across an n‐GaAs wafer (Itoh et al , 1998). Finally, characterization by CL is used to examine damage created by the FIB (Bever et al , 1992; Vetterli et al , 1995; Furuya & Saito, 1996; Endo et al , 2001). Clearly, the damage introduced by the FIB must be taken into account for FIB‐SEM tomography, as this damage may affect the CL emission and spectral features (Sahoo et al , 2004; Watanabe et al , 2007).…”
Section: Introductionmentioning
confidence: 99%
“…Nevertheless, the localization of the ion-induced defects on III-V crystals appear considerably improved, of at least a factor of 10, in relevance with all previously published results. 8,9 Finally, we have verified that these patterns (aϭ0.5 m͒ were no more detected when defined on a sample kept at a temperature above 22 K and with a 30 keV ion energy. Indeed for the lattice constant a set to 0.5 m, the sample patterned at 80 K and RT were exhibiting similar characteristics as uniformly implanted samples having no significant remaining PL structures or signal emitted from the QWs.…”
Section: B Sample Kept At 22 K During Irradiationmentioning
confidence: 54%
“…Similar limitations were evidenced with FIB patterned lines on GaAs/AlAs heterostructures and cathodoluminescence characterization. 9 In this case, without annealing procedures, a lateral spreading of implantation induced damage was found to exceed considerably the implanted region. Indeed the damages were spreading 5 m away from the implanted stripes for a dose of 10 12 cm Ϫ2 ͑100 keV Ga ϩ ions͒.…”
Section: Introductionmentioning
confidence: 95%
“…The FIB induced artifacts are described as morphological defects, crystal damage, uncontrolled Ga + implantation, amorphization, material redeposition, mixing of material, radiation damage, changes in surface geometry, and its electronic properties, etc. (Adams, 2006;Barber, 1993;Barna et al, 1999;Bever et al, 1992;Boxleitner et al, 2001;Brezna et al, 2003;Cairney and Munroe, 2003;Frey et al, 2003;Huang, 2004;Inkson et al, 2006;Ishitani et al, 1998Ishitani et al, , 2004McCaffrey et al, 2001;Nord et al, 2002;Perrey et al, 2004;Rajsiri et al, 2002;Reiner et al, 2004;Rubanov and Munroe, 2003Stanishevsky et al, 2002;Vetterli et al, 1995;Wang et al, 2005;Yabuuchi et al, 2004;Yu et al, 2006).…”
Section: Introductionmentioning
confidence: 96%